The angled shadow evaporation system at Leeds was designed in-house to support our research programme on pure spin currents. It is used to deposit lateral devices with extremely clean interfaces. For a tutorial on angled shadow evaporation please click here.
The main chamber contains a four-pocket e-gun source for high-melting point materials and 2 k-cells. The system reaches a base pressure of 10–10 Torr and has a load-lock for fast sample turnaround. Typically it is used to fabricate structures from Co, CoFe, NiFe magnetic electrodes, superconducting V and Pt, Cu and Ag normal metal electrodes. Used in conjunction with the university;s JEOL 6300FS electron beam liothgraphy tool it routinely produces devices with lateral dimensions < 100 nm.
The three co-axial rotation stages allow the sample plate to be tilted up to ± 90° to the deposition source and have full in-plane rotation of 360°. This allows for any orientation of the lithography pattern relative to the deposition angle from any of the deposition sources.